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Photomask and Next-Generation Lithography Mask Technology 2004
In this paper we give a description and analysis of a class of matricial difference schemes. This class of schemes is based in part on a generalization of the feature of classical numerical methods of being characterized by approximations at a single point in the complex plane. The schemes introduced here are effective for integrating stiff systems. © 1971 American Mathematical Society.
Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
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SICON
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Foundations of Computational Mathematics
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