L. Tilly, P.M. Mooney, et al.
Applied Physics Letters
Strained Si devices exhibit enhanced carrier mobility compared to that of standard Si CMOS devices of the same dimensions. Recent strained Si CMOS device results are reviewed. Materials issues related to the strained Si/relaxed SiGe heterostructures required for a strained Si CMOS technology are discussed.
L. Tilly, P.M. Mooney, et al.
Applied Physics Letters
T.N. Theis, T.F. Keuch, et al.
Gallium Arsenide and Related Compounds 1984
S.J. Koester, R. Hammond, et al.
DRC 2000
K. Rim, S.J. Koester, et al.
VLSI Technology 2001