Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
This paper presents an enhanced process model in an optimistic distributed simulation to develop a method for tracking causality and safe-time and its application in the design of a local fossil identification technique. The fossil identification process is reduced to a local operation that operates without requiring a GVT estimation method. The information needed for fossil identification is captured during normal event processing from the enhanced process model. This technique assumes FIFO communication channels and simulation model with static communication topology. A proof of correctness of the fossil identification technique using this enhanced process model is presented. Copyright © 2009, Inderscience Publishers.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
Frank R. Libsch, Takatoshi Tsujimura
Active Matrix Liquid Crystal Displays Technology and Applications 1997
Satoshi Hada
IEICE Transactions on Fundamentals of Electronics, Communications and Computer Sciences