Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
A proposed theory of liquid electrophotographic development explicitly accounts for the presence of excess ions. The theory shows that the maximum development possible is decreased from the neutralization limit by the ratio of the toner conductivity to the total conductivity. Three independent techniques are proposed to determine this ratio. It is found to be about 0.2 for a commercially available liquid developer.
Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
William Hinsberg, Joy Cheng, et al.
SPIE Advanced Lithography 2010
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SPIE Advances in Semiconductors and Superconductors 1990
Maciel Zortea, Miguel Paredes, et al.
IGARSS 2021