Conference paper
Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
An expression for the distribution function y(r) = exp {βu(r)}g(r), where g(r) is the radial distribution function, is obtained in the limit r → 0 for a general fluid. The logarithm of y(0) is found to be given by a rapidly convergent series in βε, where β = 1/kT, T is the temperature, and ε is the depth of the potential. Extensions of this result to mixtures and higher-order distribution functions are also given. © 1973 Taylor & Francis Group, LLC.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
E. Babich, J. Paraszczak, et al.
Microelectronic Engineering
Joy Y. Cheng, Daniel P. Sanders, et al.
SPIE Advanced Lithography 2008
Eloisa Bentivegna
Big Data 2022