Conference paper
Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
An expression for the distribution function y(r) = exp {βu(r)}g(r), where g(r) is the radial distribution function, is obtained in the limit r → 0 for a general fluid. The logarithm of y(0) is found to be given by a rapidly convergent series in βε, where β = 1/kT, T is the temperature, and ε is the depth of the potential. Extensions of this result to mixtures and higher-order distribution functions are also given. © 1973 Taylor & Francis Group, LLC.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
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