Joy Y. Cheng, Daniel P. Sanders, et al.
SPIE Advanced Lithography 2008
Two new methods for attaining convergence in self-consistent field calculations are described. They have been applied to semiconductor inversion layers at finite temperature. © 1970.
Joy Y. Cheng, Daniel P. Sanders, et al.
SPIE Advanced Lithography 2008
Michael Ray, Yves C. Martin
Proceedings of SPIE - The International Society for Optical Engineering
Amir Ali Ahmadi, Raphaël M. Jungers, et al.
SICON
Richard M. Karp, Raymond E. Miller
Journal of Computer and System Sciences