Conference paperPerformance data on new tunable attenuating PSM for 193nm and 157nm lithographyHans Becker, Frank Schmidt, et al.Photomask and Next-Generation Lithography Mask Technology 2004
PaperCalculated energy levels and optical absorption in n-type Si accumulation layers at low temperatureFrank SternPhysical Review Letters
PaperOn Seeing Spaghetti: Self-Adjusting Piecewise Toroidal Recognition of Flexible Extruded ObjectsJohn R. Kender, Rick KjeldsenIEEE Transactions on Pattern Analysis and Machine Intelligence
PaperEfficient Heuristics for Orientation Metric and Euclidean Steiner Tree Problems *Y.Y. Li, K.S. Leung, et al.J Combin Optim
