Conference paper
Isotropic treatment of EMF effects in advanced photomasks
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SPIE Photomask Technology + EUV Lithography 2009
This issue of Algorithmica present papers on various aspects of nonlinear methods for solving linear programming problems, inspired by the work of Karmarkar. This introduction describes some of these aspects and briefly mentions other recent developments in the field. A bibliography of recent articles is included. © 1986 Springer-Verlag New York Inc.
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
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SPIE Optics, Electro-Optics, and Laser Applications in Science and Engineering 1991
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PRX Quantum