Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
In this paper, we investigate inverse problems of the interval query problem in application to data mining. Let I be the set of all intervals on U = {1, 2, . . . , n}. Consider an objective function f(I), conditional functions ui(I) on I, and define an optimization problem of finding the interval I maximizing f(I) subject to ui(I) > Ki for given real numbers Ki (i = 1, 2, . . . , h). We propose efficient algorithms to solve the above optimization problem if the objective function is either additive or quotient, and the conditional functions are additive, where a function f is additive if f(I) = ∑i∈I f̂(i) extending a function f̂ on U, and quotient if it is represented as a quotient of two additive functions. We use computational-geometric methods such as convex hull, range searching, and multidimensional divide-and-conquer.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
F.M. Schellenberg, M. Levenson, et al.
BACUS Symposium on Photomask Technology and Management 1991
Amir Ali Ahmadi, Raphaël M. Jungers, et al.
SICON
Timothy J. Wiltshire, Joseph P. Kirk, et al.
SPIE Advanced Lithography 1998