Isotropic treatment of EMF effects in advanced photomasks
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
We consider the problem of interleaving sequences of positive and negative numbers in order to maximize the minimum, overall prefixes p of the interleaved sequence, of the sum of the numbers in p. A simple and efficient offline solution is given. We also consider an online version of the problem. Under a cost model suitable for the prefetching application that motivates the problem, a strongly competitive online algorithm is given. These problems abstract two practical problems of scheduling data prefetches in a multiprogrammed or multithreaded computing environment.
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
Renu Tewari, Richard P. King, et al.
IS&T/SPIE Electronic Imaging 1996
Guo-Jun Qi, Charu Aggarwal, et al.
IEEE TPAMI
Ziv Bar-Yossef, T.S. Jayram, et al.
Journal of Computer and System Sciences