J. Freeouf, D.E. Eastman, et al.
Physical Review Letters
The interface states at metal-semiconductor junctions are still a matter of debate. We present a novel approach to this issue that uses state-of-the-art techniques to prepare silicon surfaces with different surface terminations and employs non-interacting Schottky contacts to measure the barrier height. We report a difference of 50 mV in barrier height for Hg Schottky diodes on Si(111) surfaces with different surface terminations. © 1993.
J. Freeouf, D.E. Eastman, et al.
Physical Review Letters
P. Oelhafen, J. Freeouf, et al.
Thin Solid Films
H.-C.W. Huang, M. Wittmer, et al.
JES
Alan C. Warren, J. Woodall, et al.
Applied Physics Letters