Julien Autebert, Aditya Kashyap, et al.
Langmuir
We report the first measurement of local structure in the thin layers of a semiconductor superlattice using the extended x-ray absorption fine structure. The measured values of interatomic distance and Debye-Waller factor in InAs offer a direct confirmation of the structure as intended in the growth process, and set an upper limit of the lattice strain to less than 1.5%. The data also indicate an anisotropy of the electron mean-free path in the thin layers and structural disorder at distances beyond the nearest neighbors. © 1985 The American Physical Society.
Julien Autebert, Aditya Kashyap, et al.
Langmuir
Michael Ray, Yves C. Martin
Proceedings of SPIE - The International Society for Optical Engineering
Q.R. Huang, Ho-Cheol Kim, et al.
Macromolecules
Thomas H. Baum, Carl E. Larson, et al.
Journal of Organometallic Chemistry