M.A. Lutz, R.M. Feenstra, et al.
Surface Science
We report the first measurement of local structure in the thin layers of a semiconductor superlattice using the extended x-ray absorption fine structure. The measured values of interatomic distance and Debye-Waller factor in InAs offer a direct confirmation of the structure as intended in the growth process, and set an upper limit of the lattice strain to less than 1.5%. The data also indicate an anisotropy of the electron mean-free path in the thin layers and structural disorder at distances beyond the nearest neighbors. © 1985 The American Physical Society.
M.A. Lutz, R.M. Feenstra, et al.
Surface Science
Ming L. Yu
Physical Review B
O.F. Schirmer, W. Berlinger, et al.
Solid State Communications
E. Burstein
Ferroelectrics