Conference paper
Stress-driven segregation at a Si-Ge alloy surface
J. Tersoff, P.C. Kelires
Symposium on Process Physics and Modeling in Semiconductor Technology 1990
A Comment on the Letter by Y. Takada and W. Kohn, Phys. Rev. Lett. 54, 470 (1985). © 1985 The American Physical Society.
J. Tersoff, P.C. Kelires
Symposium on Process Physics and Modeling in Semiconductor Technology 1990
Rodney S. Ruoff, J. Tersoff, et al.
Nature
David Vanderbilt, J. Tersoff
Physical Review Letters
J. Tersoff, R.M. Feenstra, et al.
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films