C.T. Black, K.W. Guarini
J Polym Sci Part A
Self assembling polymers can autonomously form regular patterns at sublithographic dimensions. Integration of these materials with semiconductor processing enables high-resolution patterning of microelectronic circuit elements and offers a non-traditional pathway for continued improvements in integrated circuit performance. We discuss our efforts in IBM to demonstrate key applications of self assembly for semiconductor device fabrication. © 2005 IEEE.
C.T. Black, K.W. Guarini
J Polym Sci Part A
V. Pérez-Dieste, O.M. Castellini, et al.
Applied Physics Letters
T. Shibauchi, L. Krusin-Elbaum, et al.
Journal of Magnetism and Magnetic Materials
C.T. Black, K.W. Guarini, et al.
Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures