Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
In this paper we present a non-linear control scheme for high-speed nanopositioning based on impulsive control. Unlike in the case of a linear feedback controller, the controller states are altered in a discontinuous manner at specific instances in time. Using this technique, it is possible to simultaneously achieve good tracking performance, disturbance rejection and tolerance to measurement noise. Impulsive control is demonstrated experimentally on an atomic force microscope. A significant improvement in tracking performance is demonstrated. © 2011 IOP Publishing Ltd.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
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arXiv
R.J. Gambino, N.R. Stemple, et al.
Journal of Physics and Chemistry of Solids
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Chemistry of Materials