Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
An improved technique for bounding the mean-square error of signal parameter estimates is presented. The resulting bounds are independent of the bias and stronger than previously known bounds. © 1975, IEEE. All rights reserved.
Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
William Hinsberg, Joy Cheng, et al.
SPIE Advanced Lithography 2010
A. Gupta, R. Gross, et al.
SPIE Advances in Semiconductors and Superconductors 1990
Fan Zhang, Junwei Cao, et al.
IEEE TETC