David A. Selby
IBM J. Res. Dev
No abstract available.
David A. Selby
IBM J. Res. Dev
Donald Samuels, Ian Stobert
SPIE Photomask Technology + EUV Lithography 2007
Corneliu Constantinescu
SPIE Optical Engineering + Applications 2009
Raymond F. Boyce, Donald D. Chamberlin, et al.
CACM