Conference paper
Isotropic treatment of EMF effects in advanced photomasks
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SPIE Photomask Technology + EUV Lithography 2009
This paper analyses hopscotch algorithms when used to solve elliptic partial differential equations. A comparison with standard methods is made for the model problem. © 1979.
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
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SPIE Optical Science, Engineering, and Instrumentation 1998
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Mathematics