Robert W. Keyes
Proceedings of the IEEE
Suitably strained silicon exhibits a mobility anisotropy that can be used to advantage in field-effect transistors. The desired strain can be achieved through heteroepitaxy. Copyright © 1986 by The Institute of Electrical and Electronics Engineers, Inc.
Robert W. Keyes
Proceedings of the IEEE
Robert W. Keyes
Reports on Progress in Physics
Robert W. Keyes
IEEE T-ED
M. Pomerantz, Robert W. Keyes, et al.
Physical Review Letters