Conference paper
Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
We present a model for forest planning with habitat dispersion constraints. The problem is reduced to a linear program that is solved by a column generation approach. Generating one column reduces to a stable set problem in a graph; this is solved with linear programming techniques based on a partial description of the stable set polytope. We report computational experience with medium sized problems.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
M.F. Cowlishaw
IBM Systems Journal
Frank R. Libsch, S.C. Lien
IBM J. Res. Dev
Rolf Clauberg
IBM J. Res. Dev