Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
A 100-meV electron-energy-loss feature found frequently on cleaved Si(111)-2×1 surfaces has been studied with high-resolution electron-energy-loss spectroscopy. Scattering conditions are chosen to enhance our sensitivity to detect OH stretching vibrations. A direct correlation between the strong 100-meV loss feature and the very weak OH stretching vibration is observed for coverages estimated to be above 0.03% of a monolayer. These results cast doubt but do not exclude a recent assignment of this 100-meV loss feature to a new H-derived state. © 1985 The American Physical Society.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
Thomas H. Baum, Carl E. Larson, et al.
Journal of Organometallic Chemistry
Daniel J. Coady, Amanda C. Engler, et al.
ACS Macro Letters
M.A. Lutz, R.M. Feenstra, et al.
Surface Science