Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
The extension of rotating-compensator ellipsometry (RCE) to measurements of the system Jones matrix J of optical systems is reported. The similarities and differences of generalized RCE as compared to other methods are noted. Measurements of several anisotropic materials, as well as of "standard" optical systems having one, two and three essential (complex) elements of J are described. Finally, a completely automated procedure for the measurement and analysis of a uniaxially anisotropic surface with the optic axis in the plane of the surface is presented. © 1976.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
A. Ney, R. Rajaram, et al.
Journal of Magnetism and Magnetic Materials
Surendra B. Anantharaman, Joachim Kohlbrecher, et al.
MRS Fall Meeting 2020
Thomas H. Baum, Carl E. Larson, et al.
Journal of Organometallic Chemistry