Joseph M. Jasinski, Joan K. Frisoli, et al.
Journal of Physical Chemistry
Paper
Formation of gas-phase silyl radicals in the atomic hydrogen etching of silicon
Abstract
Mass spectrometric evidence is presented for the direct formation of gas-phase silyl radical, SiH3, as a product of the heterogeneous etching reaction of silicon films with hydrogen or deuterium atoms. © 1993.
Related
Joseph M. Jasinski, Joan K. Frisoli, et al.
Faraday Discussions of the Chemical Society
Joseph M. Jasinski
Chemical Physics Letters
Joseph M. Jasinski
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films