S.T. Pantelides, W.A. Harrison, et al.
Physical Review B
Existing calculations of diffusion coefficients in solids have so far relied on empirical potentials and/or dynamical simulations, both of which entail important limitations. We present a practical approach that is based on rate theory and allows the calculation of temperature-dependent diffusion coefficients from static first-principles calculations. Results for hydrogen in silicon are in excellent agreement with recent first-principles dynamical calculations at high temperatures and with experiment. They further elucidate the nature of diffusion pathways and anharmonic effects. © 1990 The American Physical Society.
S.T. Pantelides, W.A. Harrison, et al.
Physical Review B
Peter Margl, Karlheinz Schwarz, et al.
The Journal of Chemical Physics
C.S. Nichols, C.G. Van De Walle, et al.
Physical Review Letters
Peter E. Bloechl, C.G. Van de Walle, et al.
Symposium on Process Physics and Modeling in Semiconductor Technology 1990