K.N. Tu
Materials Science and Engineering: A
Hydrogen-related defects and oxygen vacancies in silica are analyzed using first-principles density-functional calculations. Energetics, structures, charge-state levels, and hyperfine parameters are determined. These calculations identify the hydrogen bridge related to the E41 center as the defect responsible for the stress-induced leakage current, a forerunner of dielectric breakdown of gate oxides in transistors.
K.N. Tu
Materials Science and Engineering: A
Oliver Schilter, Alain Vaucher, et al.
Digital Discovery
H.D. Dulman, R.H. Pantell, et al.
Physical Review B
Joy Y. Cheng, Daniel P. Sanders, et al.
SPIE Advanced Lithography 2008