William Hinsberg, Joy Cheng, et al.
SPIE Advanced Lithography 2010
Hydrogen-related defects and oxygen vacancies in silica are analyzed using first-principles density-functional calculations. Energetics, structures, charge-state levels, and hyperfine parameters are determined. These calculations identify the hydrogen bridge related to the E41 center as the defect responsible for the stress-induced leakage current, a forerunner of dielectric breakdown of gate oxides in transistors.
William Hinsberg, Joy Cheng, et al.
SPIE Advanced Lithography 2010
P. Alnot, D.J. Auerbach, et al.
Surface Science
J.R. Thompson, Yang Ren Sun, et al.
Physica A: Statistical Mechanics and its Applications
Sharee J. McNab, Richard J. Blaikie
Materials Research Society Symposium - Proceedings