Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
No abstract available.
Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
Oliver Bodemer
IBM J. Res. Dev
György E. Révész
Theoretical Computer Science
Elizabeth A. Sholler, Frederick M. Meyer, et al.
SPIE AeroSense 1997