Conference paper
Isotropic treatment of EMF effects in advanced photomasks
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
A technique is presented by which NC and RNC algorithms for some problems can be extended into NC and RNC algorithms, respectively, that solve more general parametric problems. The technique is demonstrated on explicit bounded degree circuits. Applications include parametric extensions of the shortest-path and spanning-tree problems and, in particular, the minimum-ratio-cycle problem, showing all these problems are in NC. © 1989 Springer-Verlag New York Inc.
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
Jonathan Ashley, Brian Marcus, et al.
Ergodic Theory and Dynamical Systems
David Cash, Dennis Hofheinz, et al.
Journal of Cryptology
A.R. Conn, Nick Gould, et al.
Mathematics of Computation