Conference paper
Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
We study the LDMt factorization of banded Toeplitz matrices. We show that, under fairly general conditions, the L, M, and D factors exhibit exponential convergence along diagonals. We also give explicit formulas for the limiting values. Our method of proof involves a generalization to matrices of the theory of continued fractions of quadratic irrationals. © 1995, All rights reserved.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
Imran Nasim, Melanie Weber
SCML 2024
L Auslander, E Feig, et al.
Advances in Applied Mathematics
Michael Ray, Yves C. Martin
Proceedings of SPIE - The International Society for Optical Engineering