Isotropic treatment of EMF effects in advanced photomasks
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
In any many-body variational approach to electron-atom scattering theory certain types of matrix elements not encountered in bound state problems must be evaluated. In this paper the new integrals which occur are identified and procedures for obtaining all but the exchange type integrals in all reasonable cases are presented. The techniques discussed are oriented toward rapid and accurate evaluation on a computer. A number of previously unpublished formulas and properties of integrals involving spherical Bessel functions are presented. © 1969.
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
Hannaneh Hajishirzi, Julia Hockenmaier, et al.
UAI 2011
Moutaz Fakhry, Yuri Granik, et al.
SPIE Photomask Technology + EUV Lithography 2011
Frank R. Libsch, Takatoshi Tsujimura
Active Matrix Liquid Crystal Displays Technology and Applications 1997