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DocEng 2009
John M. Boyer, Charles F. Wiecha
DocEng 2009
Yigal Hoffner, Simon Field, et al.
EDOC 2004
Lerong Cheng, Jinjun Xiong, et al.
ASP-DAC 2008
Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004