Conference paper
Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
Categories and Subject Descriptors: D.3.4 [Programming Languages]: Processors—code gen- eration; compilers: optimization; F.3.2 [Logics and Meanings of Programs]: Semantics ol Programming Languages—algebraic approaches to semantics. © 1998, ACM. All rights reserved.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
Zohar Feldman, Avishai Mandelbaum
WSC 2010
Oliver Bodemer
IBM J. Res. Dev
Frank R. Libsch, S.C. Lien
IBM J. Res. Dev