Dipanjan Gope, Albert E. Ruehli, et al.
IEEE T-MTT
Using thermal co-evaporation we have prepared epitaxial Cu 2ZnSnS4 (CZTS) films on Si(001) substrates. A substrate temperature as high as 370 C and proper substrate cleaning (HF-dip followed by thermal desorption of surface hydrogens) are found to be necessary for the epitaxial growth. Detailed transmission electron microscopy measurements and X-ray diffraction studies are used to reveal the orientation relation of the CZTS films with the underlying silicon substrate, and the formation of defects within the CZTS layer. © 2014 Elsevier B.V.
Dipanjan Gope, Albert E. Ruehli, et al.
IEEE T-MTT
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
E. Babich, J. Paraszczak, et al.
Microelectronic Engineering
A. Nagarajan, S. Mukherjee, et al.
Journal of Applied Mechanics, Transactions ASME