Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
CH212 molecules adsorbed on AI2O3 and A1 surfaces are used as a model system for studying the photofragmentation and desorption processes involving electronic excitation of the adsorbate. The molecules are promoted into an antibonding state with a pulsed 308-nm laser and the desorption behavior is monitored by time-of-flight mass spectrometry. The system is characterized by x-ray photoelectron spectroscopy, Auger electron spectroscopy, and thermal desorption spectroscopy. The desorption yields as well as the mass and the kinetic energy distributions are determined as a function of surface coverage and laser fluence. The results reveal the electronic, thermal, and ‘explosive” desorption characteristics depending on both the gaseous exposure and the laser irradiation conditions. © 1987, American Vacuum Society. All rights reserved.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
Imran Nasim, Melanie Weber
SCML 2024
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MRS Fall Meeting 2020
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Journal of Physics and Chemistry of Solids