C. Mathew Mate, Paul H. Kasai, et al.
IEEE Transactions on Magnetics
It is postulated that the electron beam exposure process of the AZ-type resists (those containing diazoquinones as the labile component) is initiated by dissociative electron capture producing a phenoxy radical anion and N2. Na atoms and model diazoquinone molecules, l-oxo-2-diazonaphthoquinone, 2-oxo-l-diazonaphthoquinone, and o-diazo-benzoquinone, were cocondensed in argon matrices, and the Na-to-diazoquinone electron transfer was induced by mild radiation (λ > 580 nm). ESR examination of the matrices revealed that the three diazoquinones all readily captured low-energy electrons and dissociated to yield the respective phenoxy anion radicals resulting from N2 cleavage as postulated. © 1993, American Chemical Society. All rights reserved.
C. Mathew Mate, Paul H. Kasai, et al.
IEEE Transactions on Magnetics
Torbjörn Fängström, Sten Lunell, et al.
Journal of Physical Chemistry A
Paul H. Kasai, Vedantham Raman
Tribology Letters
Paul F.A. Buijsen, Nigel P. Hacker
Tetrahedron Letters