Interfaces in silicides
F.M. D'Heurle
J. Phys. IV
The pseudobinary system TiSi2-WSi2 has been investigated from about 85% TiSi2 to 100% WSi2 up to a temperature of 1100 °C. The equilibrium phase diagram which has been established contains a continuous (from 15% to 100% WSi2) solid solution with a hexagonal structure (TaSi2 type) at low temperatures, below ∼550 °C. At about 550 °C WSi2-rich alloys split into two phases, the normal tetragonal phase of WSi2, which has a very limited solubility for TiSi2, and the hexagonal (TaSi 2) phase with the amount of WSi2 in solution decreasing with increasing temperature at about 50% at 1100 °C. The resistivity of the different alloys has been studied as a function of annealing temperature. There is considerable excess resistivity due to alloy scattering and no evidence of a marked difference in resistivity between the two phases.
F.M. D'Heurle
J. Phys. IV
A. Bourret, F.M. D'Heurle, et al.
Journal of Applied Physics
J.E.E. Baglin, F.M. D'Heurle, et al.
Applied Physics Letters
S.-L. Zhang, F.M. D'Heurle
Thin Solid Films