Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
The complex reaction path of the dissociative chemisorption of Sb4 on Si(001) involving four distinct types of precursor states is determined using a direct tracking method with scanning tunneling microscopy. The energy barriers and the prefactors for the transitions between different states are measured by analyzing the population distribution of Sb clusters as a function of thermal treatment. These precursors are found not to have thermal mobility before dissociation, contrary to the widely held notion about precursor states. © 1993 The American Physical Society.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
A. Krol, C.J. Sher, et al.
Surface Science
Shu-Jen Han, Dharmendar Reddy, et al.
ACS Nano
J.R. Thompson, Yang Ren Sun, et al.
Physica A: Statistical Mechanics and its Applications