Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
Using the the spin modulated polarized electron gun based on photoemission from positive affinity GaAs the intensity I(E, Θ, Φ) and asymmetry δ(E, Θ, Φ) are measured in LEED from Au(110). The asymmetry δ is compared with the polarization S(E, Θ, Φ) which N. Müller obtained with a Mott detector after scattering an unpolarized electron beam from the same crystal. There is excellent agreement for the (00) beams, if the scattering plane is a mirror symmetry plane of the crystal (Φ=0°, Φ=90°). From the differences for the (00) and (11) beams at Φ=35° and the (01/2) beam at Φ=90° conditions for possible models for the reconstructed Au(110)-(1×2) surface may be derived. © 1981 Springer-Verlag.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
O.F. Schirmer, W. Berlinger, et al.
Solid State Communications
R.D. Murphy, R.O. Watts
Journal of Low Temperature Physics
Joy Y. Cheng, Daniel P. Sanders, et al.
SPIE Advanced Lithography 2008