A. Thete, Daniël Geelen, et al.
Physical Review Letters
Accurately measuring defocus in cathode lens instruments (Low Energy Electron Microscopy – LEEM, and Photo Electron Emission Microscopy – PEEM) is a pre-requisite for quantitative image analysis using Fourier Optics (FO) or Contrast Transfer Function (CTF) image simulations. In particular, one must establish a quantitative relation between lens excitation and image defocus. One way to accomplish this is the Real-Space Microspot LEED method, making use of the accurately known angles of diffracted electron beams, and the defocus-dependent shifts of their corresponding real-space images. However, this only works if a sufficiently large number of diffracted beams is available for the sample under investigation. An alternative is to shift the sample along the optical axis by a known distance, and measure the change in objective lens excitation required to re-focus the image. We analytically derive the relation between sample shift and defocus, and apply our results to the measurement and analysis of achromats in an aberration-corrected LEEM instrument.
A. Thete, Daniël Geelen, et al.
Physical Review Letters
Lei Yu, Haibo Li, et al.
Ultramicroscopy
Rudolf M. Tromp
Ultramicroscopy
J. Jobst, Laurens M. Boers, et al.
Ultramicroscopy