Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
A sequential optical character recognition algorithm, ideally suited for implementation by means of microprocessors with limited storage capabilities, is formulated in terms of a binary decision tree. Upper bounds on the recognition performance are derived in terms of the stability of the digitized picture elements. The design process is described in detail. The algorithm is tested on single-font typewritten characters and the experimental and theoretical results are compared. © 1983 IEEE
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
Hang-Yip Liu, Steffen Schulze, et al.
Proceedings of SPIE - The International Society for Optical Engineering
Donald Samuels, Ian Stobert
SPIE Photomask Technology + EUV Lithography 2007
Daniel M. Bikel, Vittorio Castelli
ACL 2008