Conference paper
Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
Recent theoretical developments on the critical and multicritical behaviour of random antiferromagnets are summarized. Experimental results on antiferromagnetic GdAlO3:2.5% La reveal critical and multicritical properties distinctly different from those in the pure system. Further experiments on random antiferromagnets are proposed. © 1980.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
Daniel J. Coady, Amanda C. Engler, et al.
ACS Macro Letters
Joy Y. Cheng, Daniel P. Sanders, et al.
SPIE Advanced Lithography 2008
R.M. Macfarlane, R.L. Cone
Physical Review B - CMMP