Isotropic treatment of EMF effects in advanced photomasks
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
In [Y. Li and J. Zhou, SIAM J. Sci. Comput., 23 (2001), pp. 840-865], a new local minimax method that characterizes a saddle point as a solution to a local minimax problem was established. Based on the local characterization, a numerical minimax algorithm was designed for finding multiple saddle points. Numerical computations of many examples in semilinear elliptic PDE were successfully carried out to solve for multiple solutions. One of the important issues which remains unsolved is the convergence of the numerical minimax method. In this paper, first Step 5 in the algorithm is modified with the design of a new stepsize rule that is easier to implement practically and with which convergence results of the numerical minimax method are established for isolated and nonisolated critical points. The convergence results show that the algorithm indeed exceeds the scope of a minimax principle. In the last section, numerical multiple solutions to the Henon equation and a sublinear elliptic equation subject to zero Dirichlet boundary condition are presented to show their numerical convergence and profiles.
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
Hang-Yip Liu, Steffen Schulze, et al.
Proceedings of SPIE - The International Society for Optical Engineering
Fernando Martinez, Tao Li, et al.
ICLR 2026
Leo Liberti, James Ostrowski
Journal of Global Optimization