Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
Molecular relaxation of a copolymer designed for nano-electromechanical systems was chemically confined by varying the spacing between cross-links, δ c. A critical cross-link spacing of 1-3 nm marks a transition in the nano-mechanical properties evaluated by atomic force microscopy. The transition reveals an interplay between the cross-link spacing and the length scale for backbone relaxation, ξ α, in cooperatively rearranging regions. For δ c ≫ ξ α, the natural backbone relaxation process is relatively unaffected by the cross-links and a ductile, low hardness behavior results. For δ c ≫ ξ α, the cross-finks directly interfere with backbone relaxation and confine segmental mobility, leading to a brittle, high hardness response. © 2006 American Chemical Society.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
A. Gangulee, F.M. D'Heurle
Thin Solid Films
Zelek S. Herman, Robert F. Kirchner, et al.
Inorganic Chemistry
Kigook Song, Robert D. Miller, et al.
Macromolecules