J. Jobst, Jaap Kautz, et al.
Ultramicroscopy
We describe a process for the growth of a single, electronically decoupled graphene layer on SiC(0001). The method involves annealing in disilane to (1) prepare flat, clean substrates, (2) grow a single graphene layer, and (3) electronically decouple the graphene from the substrate. This approach uses a single process gas, at μTorr pressures, with modest substrate temperatures, thus affecting a drastic simplification over other processes described in the literature. © 2014 AIP Publishing LLC.
J. Jobst, Jaap Kautz, et al.
Ultramicroscopy
Kevin P. Weidkamp, Rudolf M. Tromp, et al.
Journal of Physical Chemistry C
Rudolf M. Tromp
Ultramicroscopy
Suneel Kodambaka, James B. Hannon, et al.
Nano Letters