Ning Li, Stephen Bedell, et al.
SID International Symposium 2013
We describe a process for the growth of a single, electronically decoupled graphene layer on SiC(0001). The method involves annealing in disilane to (1) prepare flat, clean substrates, (2) grow a single graphene layer, and (3) electronically decouple the graphene from the substrate. This approach uses a single process gas, at μTorr pressures, with modest substrate temperatures, thus affecting a drastic simplification over other processes described in the literature. © 2014 AIP Publishing LLC.
Ning Li, Stephen Bedell, et al.
SID International Symposium 2013
A. Tebyani, F.B. Baalbergen, et al.
Journal of Physical Chemistry C
Keith A. Jenkins, Damon B. Farmer, et al.
Applied Physics Letters
Shu Jen Han, Jianshi Tang, et al.
Nature Nanotechnology