Weishi Wan, Lei Yu, et al.
Ultramicroscopy
We describe a process for the growth of a single, electronically decoupled graphene layer on SiC(0001). The method involves annealing in disilane to (1) prepare flat, clean substrates, (2) grow a single graphene layer, and (3) electronically decouple the graphene from the substrate. This approach uses a single process gas, at μTorr pressures, with modest substrate temperatures, thus affecting a drastic simplification over other processes described in the literature. © 2014 AIP Publishing LLC.
Weishi Wan, Lei Yu, et al.
Ultramicroscopy
Ivan Bespalov, Yu Zhang, et al.
ACS AMI
Rudolf M. Tromp
Ultramicroscopy
Zhaoying Hu, George S. Tulevski, et al.
Applied Physics Letters