J. Jobst, Jaap Kautz, et al.
Nature Communications
We describe a process for the growth of a single, electronically decoupled graphene layer on SiC(0001). The method involves annealing in disilane to (1) prepare flat, clean substrates, (2) grow a single graphene layer, and (3) electronically decouple the graphene from the substrate. This approach uses a single process gas, at μTorr pressures, with modest substrate temperatures, thus affecting a drastic simplification over other processes described in the literature. © 2014 AIP Publishing LLC.
J. Jobst, Jaap Kautz, et al.
Nature Communications
Ning Li, Stephen Bedell, et al.
SID International Symposium 2013
Peter S. Neu, Daniël Geelen, et al.
Ultramicroscopy
Satoshi Oida, Fenton R. McFeely, et al.
Physical Review B - CMMP