Isotropic treatment of EMF effects in advanced photomasks
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
Realizing CMOS-compatible integrated lasers on silicon is a crucial step towards cost-efficient, high-functional optoelectronic integrated circuits (OEICs). Here, we report on a concept to embed active optical devices based on a bonded III-V epitaxial layer stack between the FEOL and BEOL of a CMOS silicon photonics chip. Ultra-shallow laser devices are realized with this concept and optically-pumped lasing, coupled to silicon is demonstrated for the first time with such a concept.
Jaione Tirapu Azpiroz, Alan E. Rosenbluth, et al.
SPIE Photomask Technology + EUV Lithography 2009
Veeresh Deshpande, Herwig Hahn, et al.
VLSI Technology 2017
Ronny Henker, J. Pliva, et al.
SPIE Optics + Photonics 2015
Herwig Hahn, Marilyne Sousa, et al.
Journal of Physics D: Applied Physics