Characterization of (In,Ga)As/GaAs strained-layer multiple quantum wells with high-resolution X-ray diffraction and computer simulations

Pseudomorphic, highly strained (In,Ga)As/GaAs multiple quantum well structures were grown by molecular beam epitaxy and characterized by high-resolution X-ray diffraction. Thickness, lattice mismatch and chemical composition of the quantum wells were determined from measurements of satellite Bragg reflections and comparison with calculated rocking curves. In periodic structures, quantum wells with a width of less than 10 nm can be characterized by this technique. The results are compared with transmission electron microscopy, optical absorption and optical emission spectroscopy. © 1991.