Shu-Jen Han, Dharmendar Reddy, et al.
ACS Nano
An experimental study of the capacitive parameters of submicron accumulation-mode MOS varactors is reported. Varactors are studied as a function of channel length and width. As the device channels are scaled to smaller and smaller dimensions to achieve higher frequency circuits, the capacitance tuning range decreases because of a relative increase of fixed capacitance. At the same time, the Q-factor of the varactor increases, thus requiring the circuit designer to choose the best gate length to optimize both parameters. © 2006 IEEE.
Shu-Jen Han, Dharmendar Reddy, et al.
ACS Nano
C. Zhou, Keith A. Jenkins, et al.
IRPS 2018
Stas Polonsky, Keith A. Jenkins
ISDRS 2003
Keith A. Jenkins, Eduard Cartier, et al.
IEEE Electron Device Letters