Conference paper
Modeling polarization for Hyper-NA lithography tools and masks
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
In this paper we consider relaxation methods for solving linear systems of equations. These methods are suited for execution on a parallel system of processors. They have the feature of allowing a minimal amount of communication of computational status between the computers, so that the relaxation process, while taking on a chaotic appearance, reduces programming and processor time of a bookkeeping nature. We give a precise characterization of chaotic relaxation, some examples of divergence, and conditions guaranteeing convergence. © 1969.
Kafai Lai, Alan E. Rosenbluth, et al.
SPIE Advanced Lithography 2007
Ligang Lu, Jack L. Kouloheris
IS&T/SPIE Electronic Imaging 2002
Shu Tezuka
WSC 1991
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ICML 2023