PaperEffects of mask materials on near field optical nanolithographySharee J. McNab, Richard J. BlaikieMaterials Research Society Symposium - Proceedings
PaperElectrochemical characterization of adsorption-desorption of the cuprous-suppressor-chloride complex during electrodeposition of copperJohn G. Long, Peter C. Searson, et al.JES
PaperCrystal structure and cation distribution of MnCrInS4 from synchrotron powder diffraction dataG. Will, N. Masciocchi, et al.Zeitschrift fur Kristallographie - New Crystal Structures
Conference paperCharacterization of thin dielectric films as copper diffusion barriers using triangular voltage sweepS. Cohen, J.C. Liu, et al.MRS Spring Meeting 1999
