PaperEvent monitoring and service in a flat world benefits and challengesThomas M. ChengIT Professional
PaperFast geometric approximation techniques and geometric embedding problemsMarshall W. Bern, Howard J. Karloff, et al.Theoretical Computer Science
Conference paperBetter on wafer performance and mask manufacturability of contacts with no or non-traditional serifsDonald Samuels, Ian StobertSPIE Photomask Technology + EUV Lithography 2007
Conference paperSelf-assembling materials for lithographic patterning: Overview, status and moving forwardWilliam Hinsberg, Joy Cheng, et al.SPIE Advanced Lithography 2010
