Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
We prove that the automorphism group of a one-sided subshift of finite type is generated by elements of finite order. For one-sided full shifts we characterize the finite subgroups of the automorphism group. For one-sided subshifts of finite type we show that there are strong restrictions on the finite subgroups of the automorphism group. © 1990, Cambridge University Press. All rights reserved.
Hans Becker, Frank Schmidt, et al.
Photomask and Next-Generation Lithography Mask Technology 2004
Charles A Micchelli
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