Joy Y. Cheng, Daniel P. Sanders, et al.
SPIE Advanced Lithography 2008
On GaAs (111) facets grown by a slider-free LPE technique, atomically flat areas and growth steps 6.5 Å high have been verified by the novel scanning tunneling microscopy. Nomarski interference contrast micrographs give a mean distance of the steps of 6 μm. These extremely flat and structurally perfect surfaces are thus nearly free of steps in contrast to surfaces and facets previously prepared. © 1982.
Joy Y. Cheng, Daniel P. Sanders, et al.
SPIE Advanced Lithography 2008
Thomas H. Baum, Carl E. Larson, et al.
Journal of Organometallic Chemistry
Sang-Min Park, Mark P. Stoykovich, et al.
Advanced Materials
Peter J. Price
Surface Science